| 摘要 |
THE PRESENT INVENTION PROVIDES A PROCESS FOR PRODUCING A FILM FORMING NOVOLAK RESIN, WHICH PROCESS COMPRISES: A) CONDENSING FORMALDEHYDE, PARA FORMALDEHYDE OR FORMALIN WITH ONE OR MORE PHENOLIC COMPOUNDS, IN THE PRESENCE OF AN ACID CATALYST AND THEREBY PRODUCING A NOVOLAK RESIN; B) ADDING A WATER SOLUBLE ORGANIC POLAR SOLVENT AND A PHOTORESIST SOLVENT TO THE NOVOLAK RESIN REACTION MIXTURE FROM STEP A), AT A RATIO OF PHOTORESIST SOLVENT TO WATER SOLUBLE ORGANIC POLAR SOLVENT OF FROM ABOUT 10/90 TO 70/30; C) FEEDING THE MIXTURE FROM STEP B) INTO A LIQUID/LIQUID CENTRIFUGE AT A FEED RATE OF FROM ABOUT 0.03875 TO 387.5 LITERS PER MINUTE (LITERS/MIN.) (0.01 TO 100 GALLONS PER MINUTE (GAL./MIN.)) AND AT A TEMPERATURE OF FROM ABOUT 0°C UP TO A MAXIMUM TEMPERATURE THAT IS LESS THAN THE BOILING POINT OF THE LOWER BOILING SOLVENT IN THE MIXTURE FROM STEP B), AND FEEDING A SUBSTANTIALLY PURE C5-C8 ALKANE, WATER OR AROMATIC HYDROCARBON SOLVENT INTO A SEPARATE LIQUID/LIQUID CENTRIFUGE INLET PORT AT A FEED RATE OF FROM ABOUT 0.03875 TO 387.5 LITERS/MIN. (0.01 TO 100 GAL./MIN.), ATA A RATIO OF WATER SOLUBLE ORGANIC POLAR SOLVENT/PHOTORESIST SOLVENT FROM STEP B) TO C5-C8 ALKANE, WATER OR AROMATIC SOLVENT, OF FROM ABOUT 5:1 TO ABOUT 0.5:, D) ROTATING THE LIQUID/LIQUID CENTRIFUGE CONTAINING THE MIXTURE FROM STEP C) AT A SPEED OF AT LEAST 500 RPM AND THEREBY SEPARATING AND COLLECTING A TWO-PHASE SYSTEM, FROM 2 SEPARATE OUTLEET SPORTS INTO TWO CONTAINERS, WHEREIN THE HEAVICR PHASE (H) CONTAINS THE HIGHER MOLECULAR WEIGHT NOVOLAK RESIN FRACTION, IN THE WATER SOLUBLE ORGANIC POLAR SOLVENT AND THE PHOTORESISTS SOLVENT WITH A MINOR AMOUNT OF THE C5-C8 ALKANE, WATER OR AROMATIC HYDROCARBON SOLVENT, AND THE LIGHTER PHASE (L) CONTAINS: 1) THE LOWER MOLECULAR WEIGHT NOVOLAK RESIN FRACTION, 2)C5-C8 ALKANE, WATER OR AROMATIC HYDROCARBON SOLVENT, 3) WATER SOLUBLE ORGANIC POLAR SOLVENT, AND 4) PHOTORESIST SOLVENT; E) AS THE LIGHTER PHASE (L) OF THE TWO-PHASE SYSTEM OF STEP D) IS COLLECTED IT MAY SEPARATE INTO TWO PHASES, THE LIGHTER OF THESE TWO SECOND PHASES CONTAINING THE C5-C8 ALKANE, WATER OR THE AROMATIC HYDROCARBON SOLVENT AND A MINOR AMOUNT OF THE WATER SOLUBLE ORGANIC SOLVENT AND ABOUT 15-20OF THE PHOTORESIST SOLVENT, THE HEAVIER OF THESE TWO SECOND PHASES CONTAINING LOW MOLECULAR WEIGHT NOVOLAK OLIGOMERS AND UNREACTED PHENOLIC COMPOUNDS, DISSOLVED IN THE WATER SOLUBLE ORGANIC POLAR SOLVENT AND THE PHOTORESITS SOLVENT WITH ABOUT 10-15OF THE C5-C8 ALKANE, WATER OR AROMATIC HYDROCARBON; AND F) SUBSTANTIALLY REMOVING THE RESIDUAL C5-C8, WATER OR AROMATIC HYDROCARBON SOLVENT FROM THE HEAVIER PHASE (H) FROM STEP D), AND LEAVING THE NOVOLAK RESIN IN THE PHOTORESIST SOLVENT. THE RESIN SOLUTION MAY THEN BE UPON DEMAND FOR THE PREPARATION OF PHOTORESISTS.
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