| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device and a method of manufacturing a device, both of which capable of improving throughput by performing a parallel processing of exposure operation at one substrate stage and alignment measurement operation at other substrate stage. <P>SOLUTION: A main controller monitors measured values of an interferometer system so that, while a wafer W retained by one stage (for example, WS2) is exposed, the mark detection operation by an alignment system WA at the other stage (for example, WS1) is performed; and controls robot arms (20 and 22) after two stage operations are controlled to replace positions of the one stage and the other stage. Therefore, it is possible to improve throughput by the parallel processing at both stages; and if replacement of wafers is performed on a stage at a predetermined position within a stage movement range during alignment after replacing positions, it is also possible that, while a wafer retained by the other stage is exposed, the mark detection operation by the alignment system at one stage is performed in parallel by replacing both stage operations. <P>COPYRIGHT: (C)2007,JPO&INPIT |
