| 摘要 |
A wet etching apparatus is provided to improve uniformity and performance of a display device by performing an etching process and a cleaning process in single space. A substrate is loaded on a loader unit(211). An etching solution is sprayed to etch the substrate loaded from the loader unit and a cleaning solution is sprayed to clean the etching solution on the substrate in an etching/cleaning unit(212). A dry unit(213) dries the substrate whose etching solution is cleaned from the etching/cleaning unit. An unloader unit(214) transfers the substrate. The etching/cleaning unit includes a roller unit, a nozzle, and a cleaning solution nozzle. The roller unit transfers the substrate. The etching solution nozzle sprays the etching solution to the substrate transferred by the roller unit. The cleaning solution nozzle sprays the cleaning solution to the substrate where the etching solution is sprayed.
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