| 摘要 |
Provided is a photomask having a structure to prevent electric charges accumulated in a light barrier from immigrating to a shot region susceptible to discharge of static electricity, thereby preventing destruction of pattern caused by discharge of static electricity in the photomask. The photomask includes a transparent substrate; a shot region(52) having a pattern formed on the transparent substrate; and a cutoff region(60) covered with a light barrier around the shot region on the transparent substrate; and a static electricity prevention ring(52) formed by removing a part of the light barrier around the shot region so as to separate the light barrier around the shot region from the light barrier of the outer part of the transparent substrate. The static electricity prevention ring is spaced farther than an offset margin of light from the boundary of the shot region and has a width of 0.5 mm to 2.0 mm.
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