发明名称 SUBSTRATES TREATING APPARATUS
摘要 An apparatus for processing a substrate is provided to prevent a nozzle from being separated from a right position and to easily control the right position of the nozzle by using a nozzle controlling member. A process tube has a predetermined space therein. A flange(120) supports the process tube. A boat mounts plural substrates thereon to carry the substrates in the process tube. A nozzle is installed at a side of the flange and sprays process gas into the process tube. A nozzle controlling member(130) supports the nozzle and controls the position thereof. The nozzle controlling member includes a nozzle support(132), a rotation screw(136), a control member support(134), and a space maintaining member(138). The nozzle support supports the nozzle. The rotation screw controls the height of the nozzle support. The control member support is extended from an inner wall of the flange. The rotation screw is inserted into the extended part of the control member support to be rotated. The space maintaining member between the rotation screw and the nozzle support maintains a space between the nozzle support and the rotation screw.
申请公布号 KR20070076082(A) 申请公布日期 2007.07.24
申请号 KR20060005053 申请日期 2006.01.17
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, JUNG NAM
分类号 H01L21/02 主分类号 H01L21/02
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