METHOD AND PLANT FOR EVAPORATION OF REAGENTS USED FOR APPLICATION OF COATS BY CHEMICAL DEPOSITION FROM VAPOR PHASE

摘要

FIELD: evaporation of liquid reagents used as precursors at application of coats by chemical deposition from vapor phase. ^ SUBSTANCE: liquid precursors of coat are continuously injected into evaporation chamber for forming the vapor. Evaporation chamber is provided with unit for distribution of liquid precursors of coat and is set in rotation by drive magnetic clutch not provided with seals. According to one version, gas forming the barrier before evaporation chamber is injected into zone located near evaporation chamber; velocity of this gas exceeds velocity of coat precursor vapor escaping from evaporation chamber, thus excluding penetration of vapor into drive magnetic clutch. According to another version, first member of drive magnetic clutch is connected with liquid precursor distributing unit located in evaporation chamber. Second member of drive magnetic clutch located near first member outside the evaporation chamber is set in rotation by first member of clutch which is connected with it by magnetic field. ^ EFFECT: possibility of obtaining pure flow of vapor used for chemical deposition of coats. ^ 56 cl, 5 dwg