| 摘要 |
According to an aspect of the invention, there is provided a white defect repairing method of a photomask which repairs a white defect present at an edge portion of a pattern of the photomask, the method including forming a groove or a hole having a tilted side wall which inhibits passage of exposure light at a position corresponding to that of the white defect on a translucent substrate of the photomask.
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