发明名称 FILM DEPOSITION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a film deposition device capable of forming a film of intended film thickness without irregularity in film thickness by using a method different from conventional one. SOLUTION: An irradiating light is applied to a liquid drop Lo positioned on a substrate S to let the drop Lo glow. A discharge quantity of the drop Lo is measured based on luminescence intensity of a glowing light (fluorescence and phosphorescence and the like). In the case where the measured luminescence intensity of the light is lower than a predetermined value, a drop position area P is determined as discharge failure and a drop Lo is additionally discharged to the drop position area P by once again using a discharge nozzle N of a drop discharge head 21 which has been used. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007179880(A) 申请公布日期 2007.07.12
申请号 JP20050377158 申请日期 2005.12.28
申请人 SEIKO EPSON CORP 发明人 KITABAYASHI ATSUSHI
分类号 H05B33/10;B05C5/00;B05C11/00;H01L51/50 主分类号 H05B33/10
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