发明名称 TRANSFER DEVICE, NORMAL PRESSURE TRANSFER DEVICE AND VACUUM PROCESSING APPARATUS
摘要 A transfer device (17) in a semiconductor processing system includes first and second actuation mechanisms (9A, 9B) having first and second support sections movable on first and second vertical planes, respectively, the latter being parallel with each other. First and second movable blocks (18A, 18B) are supported on the first and second support sections so that they may be horizontally moved by the first and second actuation mechanisms. Disposed on the first and second movable blocks are first and second handling mechanism (19A, 19B) capable of extension and contraction for handling a processing subject substrate (W). A control section (20) controls the operation of the first and second actuation mechanisms so that the first and second movable blocks may not interfere with each other.
申请公布号 KR20070074633(A) 申请公布日期 2007.07.12
申请号 KR20077011526 申请日期 2007.05.21
申请人 TOKYO ELECTRON LIMITED 发明人 HIROKI TSUTOMU
分类号 B65G49/00;H01L21/68;B65G49/07;H01L21/677 主分类号 B65G49/00
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