| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive material processing apparatus equipped with an out-tank processing unit comprising an out-tank conveying mechanism conveying a photosensitive material in processing liquid outside a processing tank capable of being moved up and down and a liquid dipping part supplying the processing liquid to the photosensitive material being carried by the out-tank conveying mechanism, wherein photosensitive material processing can be speeded up and a photosensitive material surface is hardly mechanically damaged or the photosensitive material processing can be speeded up and processing reaction between the photosensitive material surface and a processing liquid component is easily accelerated by making larger the absolute amount of processing liquid held on the photosensitive material surface. SOLUTION: The liquid dipping part comprises a fixed frictional support means 90b of rubbing and supporting the photosensitive material conveyed by an out-tank conveying mechanism, a liquid reservoir means V of reserving the processing liquid such that at least a base end portion of the frictional supporting means 90b is dipped in the processing liquid, and liquid feed means 58A and 58B of continuously replacing the processing liquid in the liquid reservoir means V. COPYRIGHT: (C)2007,JPO&INPIT
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