发明名称 |
Semiconductor device and method of manufacturing the same |
摘要 |
In a semiconductor device in which the gate electrode of a MISFET formed on a semiconductor substrate is electrically connected to a well region under the channel of the MISFET, the MISFET is formed in an island-shaped element region formed on the semiconductor substrate, and electrical connection between the gate electrode of the MISFET and the well region in the semiconductor substrate is done on the side surface of the island-shaped element region.
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申请公布号 |
US7242064(B2) |
申请公布日期 |
2007.07.10 |
申请号 |
US20040810837 |
申请日期 |
2004.03.29 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
YAGISHITA ATSUSHI;SAITO TOMOHIRO;IINUMA TOSHIHIKO |
分类号 |
H01L29/76;H01L21/336;H01L29/423;H01L29/786 |
主分类号 |
H01L29/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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