| 摘要 |
A unit for adjusting the temperature of a dome in a plasma dry-etching apparatus is provided to avoid mass-production of defect wafers caused by separated polymer dropping to the surface of a wafer by installing a dome temperature adjusting unit in the upper part of a ceramic dome in a process chamber. Both sides of a housing(10) are opened and a ceramic dome(100) is inserted into the housing through one of both the sides. A plurality of RF coils(30) are sequentially arranged in the housing with respect to the top of the ceramic dome. The RF coils are fixed by a fixing bracket(20) while the RF coils are sequentially arranged with respect to the top of the ceramic dome such that the fixing bracket is installed in the housing. The fixing bracket is raised up in a direction separated from the top of the ceramic dome to separate the surface of the ceramic dome from the plurality of RF coils, and a spacer(40) is installed in the housing while the fixing bracket is fixed. An inward flange(12) is formed in the housing. An outward flange(22) opposite to the inward flange of the housing is formed in the fixing bracket. The spacer can be formed between the fixing bracket and the outward flange.
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