发明名称 SUBSTRATE SUPPORTING MECHANISM, RESIN APPLYING DEVICE, RESIN CURING DEVICE AND SUBSTRATE PROCESSING SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a substrate supporting mechanism provided with a constitution capable of optimally supporting a substrate even when an electronic component is mounted in which damage or faulty mounting is readily generated upon transportation. SOLUTION: The substrate supporting mechanism 25 for supporting a tape-type substrate 2 is transferred into a predetermined direction, and has the electronic component 3 mounted thereon. The mechanism is equipped with a substrate guiding unit 41 for guiding both ends in the widthwise direction of the substrate 2, and a substrate abutting unit 42e for supporting the substrate 2 by being abutted against a position avoiding a mounting part 2a on which the electronic component 3 is mounted. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007173607(A) 申请公布日期 2007.07.05
申请号 JP20050370593 申请日期 2005.12.22
申请人 ATHLETE FA KK 发明人 DOBASHI YOSHIHIRO;KYUSEKI TOSHISHIGE
分类号 H01L21/50;B05C5/00;B05C9/14;B05C13/02;H01L21/56 主分类号 H01L21/50
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