发明名称 PATTERNING METHOD, AND METHOD OF MANUFACTURING ELECTROOPTICAL DEVICE, COLOR FILTER, LIGHT EMITTER AND THIN-FILM TRANSISTOR
摘要 <p><P>PROBLEM TO BE SOLVED: To form a pattern comprising liophilic parts and liophobic parts by a simple process as compared with a conventional one. <P>SOLUTION: This patterning method is characterized by comprising: a surface treatment step of exposing a surface of a workpiece 20 to an atmosphere containing at least one kind selected from hydrogen, deuterium, deutrated hydrogen and tritium; an exposure step of partially exposing the surface of the workpiece to light after the surface treatment process to form exposed parts 25 and non-exposed parts; and a step of providing a liquid 24 to the exposed parts 25 or the non-exposed parts of the workpiece. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007173085(A) 申请公布日期 2007.07.05
申请号 JP20050370096 申请日期 2005.12.22
申请人 CANON INC 发明人 ONO TAKEO;IKEDA ATSUSHI;KAWASE NOBUO;SAITO KEISHI
分类号 H05B33/10;G02B5/20;G09F9/00;H01L21/336;H01L29/786;H01L51/50;H05B33/12;H05B33/22 主分类号 H05B33/10
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