SMALL VOLUME SYMMETRIC FLOW SINGLE WAFER ALD APPARATUS

摘要

An ALD reactor chamber contains a vertically moveable heater-susceptor having an attached annular attached flow ring conduit at its perimeter, which conduit has an external surface at its edge that isolates the outer space of the reactor above a wafer and below the wafer to the bottom of the flow ring when the heater-susceptor is in its process position. When the susceptor is in the process position, the outer edge of the flow ring is placed in proximity to an annular ring attached to a Hd of the reactor and together the ring and conduit form a tongue-in-groove (TIG) configuration. In some cases, the TIG design may have a staircase contour (SC), thereby limiting diffusion-backflow of downstream gases to the outer space of the reactor.