| 摘要 |
An exposure apparatus is provided to minimize the warpage of a yaw guide by increasing a connection torque between the yaw guide and a platen using a first and a second screws. An exposure apparatus includes a platen, a yaw guide, a plurality of first screws and a plurality of second screws. A stage moves to and fro on the platen(20). The yaw guide is installed at a side of the platen. The plurality of first screws(110) are connected with upper and lower portions of the platen. The plurality of second screws(120) are connected with lateral portions of the platen. The first and the second screws are used for connecting the yaw guide and the platen with each other.
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