IMAGE SENSOR AND METHOD OF MANUFACTURING THE SAME

摘要

A method for manufacturing an image sensor is provided to improve the light absorbing rate by sputter-etching the surface of a photodiode to have a rough surface, thereby improving the photo sensitivity thereof. Plural embossed photodiodes(400) are formed on a semiconductor substrate, and an interlayer dielectric(200) is formed on the semiconductor substrate. A color filter layer(300) is formed on the interlayer dielectric, and a planarized layer(250) is formed on the entire surface of the substrate comprising the color filter layer. Plural microlenses are formed on the planarized layer corresponding to the color filter layer.