| 摘要 |
A particle removing method of a photomask is provided to remove particles from a photomask and to remove simultaneously predetermined ions capable of generating the particles in the air by using a gas spraying process. A photomask is formed by forming a light shielding pattern(110) on a quartz substrate(100). The photomask is loaded in exposure equipment. An exposure process is performed by using the photomask. A gas spraying process is performed on the photomask under the exposure process by using a predetermined gas. An inert gas is used as the predetermined gas. The inert gas is used for removing ion residues and particles caused by the ion residues remaining in the air.
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