| 摘要 |
PROBLEM TO BE SOLVED: To provide composition or the like for forming a low dielectric constant film capable of forming a film with high strength and low dielectric constant. SOLUTION: The composition for forming a low dielectric constant film contains at least polysiloxane which is a hydrolysis product of alkoxysilane represented by a general formula (1), and two or more radiolytic compounds maximum absorption wavelengths of which are different from each other. Here, X in the general formula (1) represents at least one of a hydrogen atom, a fluorine atom, alkyl group, aryl group, vinyl group and alicyclic group. R represents at least one of a hydrogen atom, alkyl group, aryl group, vinyl group and alicyclic group. An 'n' represents an integer of 0 to 3. There are preferable aspects such as an aspect in which a content of the radiolytic compound is 0.1 to 200 parts by mass to 100 parts by mass of the polysiloxane, an aspect which contains two or more radiolytic compounds maximum absorption wavelengths of which are different from each other, an aspect which contains two or more radiolytic compounds molecule sizes of which are different from each other, or the like. COPYRIGHT: (C)2007,JPO&INPIT
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