Indium oxide-tin oxide powder and sputtering target using the same

摘要

The invention provides an indium oxide-tin oxide powder which can be produced at low cost and which can provide a high-density sputtering target having a prolonged target life, and a sputtering target employing the powder. The indium oxide-tin oxide powder containing an In-Sn oxide as a predominant component is characterized in that the oxide powder contains no compound oxide (In₄Sn₃O₁₂) detectable through X-ray diffraction and has a SnO₂ solid solution amount in In₂O₃ of 2.3 mass or more, the SnO₂ solid solution amount being calculated from the precipitated SnO₂ content (mass %) obtained from the ratio between integral diffraction intensity attributed to In₂O₃ (222) and integral diffraction intensity attributed to SnO₂ (110).