发明名称 METHOD AND DEVICE FOR THE PURIFICATION OF PROCESS SOLUTIONS
摘要 <p>The present invention relates to a method for the purification of a process solution that can be used in the surface treatment, in particular an electrolyte for the galvanic or autocatalytic deposition of a metal layer on a substrate, by means of a polymer resin which is able to adsorb impurities from the process solution and thus to at least partially remove the impurities from the process solution, that is characterized in that the process solution is successively brought into contact with at least two polymer resins or partial flows of the process solution are in parallel brought into contact with at least two polymer resins, wherein the polymer resins differ from each other with respect to their physical-chemical properties. Furthermore, the present invention relates to a device for the purification of a process solution in the surface treatment, in particular an electrolyte for the galvanic or autocatalytic deposition of a metal layer on a substrate, comprising at least two units for accommodating a polymer resin, that is characterized in that the at least two units for accommodating a polymer resin are in fluidic communication such that the process solution successively flows through the units for accommodating a polymer resin or partial flows of the process solution respectively flow through the units in parallel, wherein the units for accommodating a polymer resin accommodate polymer resins that are different with respect to their physical-chemical properties.</p>
申请公布号 SG132643(A1) 申请公布日期 2007.06.28
申请号 SG20060081616 申请日期 2006.11.23
申请人 ENTHONE INC. 发明人 WERNER CHRISTOPH;FUHRMANN AXEL;MOBIUS ANDREAS
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