ALIGNMENT METHOD, DESIGN METHOD OF MASK PATTERN, MASK, DEVICE MANUFACTURING METHOD, ALIGNMENT DEVICE, AND EXPOSURE DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method or the like of accurately aligning a substrate with a strained silicon technology applied, and a design method or the like of mask pattern for forming an alignment mark in a substrate with the strained silicon technology applied.

SOLUTION: A device pattern is formed by an alignment method at a predetermined position of a substrate P while locally straining specific regions C, E. The method comprises a first process of obtaining information regarding the specific regions C, E based on design information of the device pattern, and a second process of fixing an alignment condition when performing alignment based on information obtained.

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