发明名称 APPRATUS FOR CONTROLLING FAIL GENERATION OF COOLING UNIT OF IMPLANTER
摘要 An apparatus for controlling a fail of a cooling apparatus in ion implantation equipment is provided to stop an ion implantation process when a cooling apparatus fails by generating an interlock in an ion implanting process chamber. A cooling apparatus detects a heat exchange fail state to generate a fail detection signal. A controller(32) receives the fail detection signal from the cooling apparatus and blocks control power to stop generation of an ion beam. The cooling apparatus includes a fail detecting part(40) and a first LED(light emitting diode). The fail detecting part can detect the heat exchange fail state to generate the fail detection signal. The first LED turns on by the fail detection signal generated from the fail detecting part to display the heat exchange fail state. The controller can include a first relay, a second LED, a second relay and a beam control part(42). The first relay supplies control power. The second LED displays the heat exchange fail state by the fail detection signal generated from the fail detecting part. The second relay switches off when the second LED turns on and blocks the control power supplied by the first relay. The beam control part blocks beam power when the control power from the second relay is blocked.
申请公布号 KR20070066004(A) 申请公布日期 2007.06.27
申请号 KR20050126681 申请日期 2005.12.21
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, KYOUNG CHON
分类号 H01L21/265;H01J37/30 主分类号 H01L21/265
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