| 摘要 |
A noncontact IC tag 1 comprises a base film 11 , a noncontact IC circuit 2, 3 formed on the base film 11 , and a plastic film or paper serving as a surfacing sheet 4 , having a non-conductive, lustrous metal film 6 m formed by deposition, laminated to the base film 11 on the side of the noncontact IC tag circuit 2, 3 . The surface roughness of the non-conductive, lustrous metal film 6 m, determined by atomic force microscopy, is more than 10 nm and 100 nm or less as indicated by the center line average height Ra. In the case where the non-conductive, lustrous metal film 6 m is formed on the outer surface of the surfacing sheet 4 , a concealing layer 4 a may further be formed on the inner surface of the surfacing sheet 4 in order to enhance concealing properties.
|
