Stability for coapplication

摘要

A composition comprising a stable mixture of at least one stain resist agent, at least one soil resist agent, and at least one coapplication enhancer, said enhancer comprising at least one of an alkali metal salt; alkali metal aryl salt; ammonium salt; ammonium aryl salt; aryl sulfonic acid; urea; amide; alkylamide; dialkylamide; amide of C₁ to C₆ alkanoic acids or of C₂ to C₆ alkandioic acids; diamides of C₂ to C₆ alkandioic acids; cyclic imide of C₂ to C₆ alkandioic acids; C₃ to C₆ lactams, or combinations thereof, is disclosed.