| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a thin-film pattern formation apparatus and its formation process, which simplify a formation step of a metal thin-film line, shorten the time required for the process, and also simplify its production equipment. <P>SOLUTION: The present invention comprises a chamber case, which keeps the internal space in communication with the outside and which is provided with a first fixing unit and a second fixing unit, a pattern electrode plate which is provided with bump electrodes with a shape of a predetermined pattern and is fixed on the first fixing unit, the second fixing unit is provided within the chamber case with a predetermined space from the pattern electrode plate and to which a substrate coated with a metal nano-substance in the form of ink is fixed, a power supply unit for supplying power to the first fixing unit and the second fixing unit so that they can form electrodes, and a drying unit for drying the metal nano-substance in the form of ink patterned on the substrate. <P>COPYRIGHT: (C)2007,JPO&INPIT |
