发明名称 |
SIMULATION EQUIPMENT, SIMULATION PROGRAM, AND SIMULATION METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide simulation equipment which can carry out simulation in a short time considering the interaction between two phenomena of different scales. SOLUTION: The simulation equipment carries out simulation on a semiconductor process of a semiconductor device based on the reaction phenomenon between chemical species used for the semiconductor process and the semiconductor device. This simulation equipment includes a simulator which calculates the probability of reaction between the chemical species and the semiconductor device depending on a fine structure B or a plurality of materials of the semiconductor device or the probability of the deactivation of the chemical species, and then carries out simulation on a physical phenomenon inside a reaction furnace based on the probability of reaction or the probability of deactivation. COPYRIGHT: (C)2007,JPO&INPIT
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申请公布号 |
JP2007149782(A) |
申请公布日期 |
2007.06.14 |
申请号 |
JP20050339299 |
申请日期 |
2005.11.24 |
申请人 |
TOSHIBA CORP |
发明人 |
TAMAOKI NAOKI;UI AKIO;TAKASE TOSHIAKI;ICHIKAWA HISASHI |
分类号 |
H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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