| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition that satisfies the need for high sensitivity, high resolution, and excellent line edge roughness and is also excellent in dissolution contrast, and provide a pattern forming method using it. <P>SOLUTION: This composition includes a resin (A) which is insoluble or hardly soluble in an alkali developer having repeated units of a structure expressed in general formula (1), (2), and (3), and which turns soluble in an alkali developer under the effect of acid. <P>COPYRIGHT: (C)2007,JPO&INPIT |
