| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sulfonic acid salt and a derivative thereof, capable of preventing the elution into water at exposure while being soaked in ArF solution, and suitable as a raw material for an photoacid-generating agent of a resist material or the photoacid-generating agent because of effective usability or the like for the exposure while being soaked in the liquid; and to provide the photoacid-generating agent and a resist material using the agent, and a pattern-forming method. <P>SOLUTION: The sulfonic acid salt is represented by formula (1): CF<SB>3</SB>-CH(OCOR)-CF<SB>2</SB>SO<SB>3</SB><SP>-</SP>M<SP>+</SP>(wherein, R is a substituted or nonsubstituted 1-20C linear, branched or cyclic alkyl group or a substituted or nonsubstituted 6-14C aryl group; M<SP>+</SP>is a lithium ion, a sodium ion, a potassium ion, an ammonium ion or a tetramethylammonium ion). The sulfonic acid allows an acyl group from slightly bulky to highly bulky, a benzoyl group, a naphthoyl group, an anthroyl group or the like to be easily introduced, to enable a large width of molecular design to be adopted because the sulfonic acid has an ester site in the molecule. <P>COPYRIGHT: (C)2007,JPO&INPIT |
