发明名称 SOLID STATE IMAGING DEVICE AND ITS MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To reduce a parasitic capacitance of a floating diffusion part while adopting direct sticking structure. <P>SOLUTION: A light receiving part 21 and the floating diffusion part 22 are separately formed on a semiconductor substrate 20 (S11), and a light-transmitting adhesive agent 31 is applied to a region corresponding to the light receiving part 21 on the semiconductor substrate 20 (S22), and a light-transmitting plate material 30 is stuck on the semiconductor substrate 20 to which the light-transmitting adhesive agent 31 is applied (S23). Here, before applying the light-transmitting adhesive agent 31, a weir portion 24 on the semiconductor substrate 20 is so formed that the light-transmitting adhesive agent 31 applied to the region corresponding to the light receiving part 21 is prevented from flowing into the region corresponding to the floating diffusion part 22 on the semiconductor substrate 20 (S18). <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007150266(A) 申请公布日期 2007.06.14
申请号 JP20060272097 申请日期 2006.10.03
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 TAKEUCHI YASUO;KOMATSU TOMOKO;TERANISHI SHINICHI;MASUDA TOMOKI;HARADA YUTAKA;HARADA MITSURU;OBAYASHI TAKASHI
分类号 H01L27/14 主分类号 H01L27/14
代理机构 代理人
主权项
地址