| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a salt usable as an acid generator to give a chemically amplified resist composition capable of forming a pattern having good pattern form and exhibiting high resolution. <P>SOLUTION: The salt is expressed by formula (I) (Q<SP>1</SP>and Q<SP>2</SP>are each independently a fluorine atom or 1-6C perfluoroalkyl group; the ring X is a monocyclic or bicyclic 3-30C hydrocarbon group; n is an integer of 1-12; and A<SP>+</SP>is an organic counter ion; the ring X may contain one or more substituents selected from 1-6C alkyl, 2-6C alkenyl, 2-6C alkoxy and 1-4C perfluoroalkyl group). <P>COPYRIGHT: (C)2007,JPO&INPIT |
