发明名称 PATTERN CORRECTION DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a pattern correction device capable of easily deciding whether a correction operation can start or not. <P>SOLUTION: In the pattern correction device, when a correction liquid 20 is started to be atomized in an atomizing part 15, the pressure of an atomizing gas flowing into an atomizing nozzle 21 from a mass flow controller 51 is detected with a pressure sensor 52 to find that the atomized correction liquid 20 is started to be ejected from a coating nozzle 30. Therefore, the decision whether a correction operation can start or not is easy to be done. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007144280(A) 申请公布日期 2007.06.14
申请号 JP20050340337 申请日期 2005.11.25
申请人 NTN CORP 发明人 KOIKE TAKASHI;SHIMIZU SHIGEO
分类号 B05B7/32;H01J9/50;H01J11/02;H01J11/22;H01J11/34;H01J11/36 主分类号 B05B7/32
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