| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum film-forming method for forming a film of adequate and stable quality on the surface of a substrate by using a vacuum vapor deposition technique, and to provide a vacuum film-forming apparatus. SOLUTION: This vacuum film-forming method comprises the steps of: degassing a vapor-depositing material in a vacuum; supplying the vapor-depositing material to a film-forming chamber without opening the chamber to atmospheric air; and forming the thin-film of the vapor-depositing material on a substrate. The degassing device is any one of a resistance heating device, a heater, an infrared lamp, a high-frequency induction-heating device, an electron irradiation device using an electron gun and a plasma generator. The vapor-depositing material is degasified in an atmosphere of any one of nitrogen gas, argon gas and hydrogen gas. A water content in the vapor-depositing material after having been degasified is 1.0% or less. COPYRIGHT: (C)2007,JPO&INPIT
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