PLASMA FILM DEPOSITION EQUIPMENT

摘要

Plasma film deposition equipment in which plasma density and sputter efficiency are enhanced by preventing occurrence of corner in sheet plasma, and stable operation is ensured by preventing occurrence of corner in sheet plasma. The plasma film deposition equipment comprises a plasma gun (1) capable of discharging source plasma toward the transporting direction, a sheet plasma deformation chamber (2), a pair of magnetic field generating means (9) arranged with the same poles facing, and a film deposition chamber (3). A shaping electromagnetic coil (6) is provided on the upstream side of the pair of magnetic field generating means (9) in the transporting direction, and the pair of magnetic field generating means (9) and the shaping electromagnetic coil (6) generate a magnetic field having a substantially constant flux density in the transporting direction at that portion, which the shaping electromagnetic coil (6) and the pair of magnetic field generating means (9) pass, of the center of transportation (100) and in the vicinity thereof.