发明名称 Porous organosilicates with improved mechanical properties
摘要 Oxycarbosilane materials make excellent matrix materials for the formation of porous low-k materials using incorporated pore generators(porogens). The elastic modulus numbers measured for porous samples prepared in this fashion are 3-6 times higher than porous organosilicates prepared using the sacrificial porogen route. The oxycarbosilane materials are used to produce integrated circuits for use in electronics devices.
申请公布号 US7229934(B2) 申请公布日期 2007.06.12
申请号 US20050031418 申请日期 2005.01.07
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 DUBOIS GERAUD;HEDRICK JAMES;KIM HO-CHEOL;LEE VICTOR;MAGBITANG TEDDIE;MILLER ROBERT;SIMONYI EVA;VOLKSEN WILLI
分类号 H01L21/31;H01L21/469 主分类号 H01L21/31
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