METHOD FOR ESTABLISHING A MODEL OF A DIMENSIONAL RESPONSE OF A SUBSTRATE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD USING THE SAME

摘要

Provided is a method for establishing a model of a dimensional response of a substrate, whereby a model of the dimensional response is deduced from differences between the preset spatial distribution and the measured spatial distribution. The method for establishing a model of a dimensional response of a substrate comprises the steps of: forming many alignment features on the surface of the substrate; distributing the alignment features across the surface of the substrate such that a spatial distribution thereof is preset by assuming a preset substrate temperature; measuring the temperature of the substrate; measuring a spatial distribution of the alignment features at the measured substrate temperature; and deducing a model of the dimensional response from differences between the preset spatial distribution and the measured spatial distribution. The substrate is a reference substrate which has similar physical characteristics and is one of a class of substrates to be treated in a lithography apparatus. The spatial distribution of the alignment features of the reference substrate is measured when the reference substrate is supported on a substrate supporter of the lithography apparatus. One of a class of the substrates is successively placed on the substrate supporter. The temperature of the substrate supported on the substrate supporter is measured at each of many regions distributed across the substrate surface. The treatment of the substrate is regulated on the basis of a correlation between the change in the substrate dimension and a dimensional response model deduced from the reference substrate.