发明名称 |
Charged particle beam processing method and charged particle beam apparatus |
摘要 |
A reference area that contains a straight contour of a workpiece pattern is irradiated with a beam at a fixed interval to form images. The positions of the contour line in the images before and after a certain time of image formation are compared with each other and the amount of displacement between the positions is calculated. When the workpiece is processed, the beam is applied to the process position corrected by the amount of displacement.
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申请公布号 |
US2007114460(A1) |
申请公布日期 |
2007.05.24 |
申请号 |
US20060546124 |
申请日期 |
2006.10.10 |
申请人 |
MURAMATSU MASASHI;KOZAKAI TOMOKAZU;HAGIWARA RYOJI |
发明人 |
MURAMATSU MASASHI;KOZAKAI TOMOKAZU;HAGIWARA RYOJI |
分类号 |
G21K5/10 |
主分类号 |
G21K5/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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