发明名称 TITANIUM COMPLEXES, PROCESS FOR PRODUCTION THEREOF, TITANIUM -CONTAINING THIN FILMS, AND METHOD FOR FORMATION THEREOF
摘要 <p>The invention relates to novel titanium complexes which have excellent vaporization characteristics and thermal stability and are useful as raw material in forming titanium-containing thin films by CVD, ALD, or the like; a process for the production of the complexes; titanium-containing thin films formed by using the complexes; and a method for formation of the films. According to the invention, a titanium complex represented by the general formula (1) is produced by reacting a diimine represented by the general formula (2) with metallic lithium and then with a tetrakisamido complex represented by the general formula (3) and a titanium-containing thin film is formed by using the titanium complex as the raw material: [Chemical formula 1] (2) [Chemical formula 2] Ti(NR&lt;SUP&gt;5&lt;/SUP&gt;R&lt;SUP&gt;6&lt;/SUP&gt;)&lt;SUB&gt;4&lt;/SUB&gt; (3) [Chemical formula 3] (1) wherein R&lt;SUP&gt;1&lt;/SUP&gt; and R&lt;SUP&gt;4&lt;/SUP&gt; are each alkyl of 1 to 6 carbon atoms, or the like; R&lt;SUP&gt;2&lt;/SUP&gt; and R&lt;SUP&gt;3&lt;/SUP&gt; are each independently hydrogen, alkyl of 1 to 3 carbon atoms, or the like; and R&lt;SUP&gt;5&lt;/SUP&gt; and R&lt;SUP&gt;6&lt;/SUP&gt; are each independently alkyl of 1 to 4 carbon atoms, or the like.</p>
申请公布号 WO2007055140(A1) 申请公布日期 2007.05.18
申请号 WO2006JP321880 申请日期 2006.11.01
申请人 TOSOH CORPORATION;SAGAMI CHEMICAL RESEARCH CENTER;TADA, KEN-ICHI;INABA, KOICHIRO;FURUKAWA, TAISHI;CHIBA, HIROKAZU;YAMAKAWA, TETSU;OSHIMA, NORIAKI 发明人 TADA, KEN-ICHI;INABA, KOICHIRO;FURUKAWA, TAISHI;CHIBA, HIROKAZU;YAMAKAWA, TETSU;OSHIMA, NORIAKI
分类号 C07F7/28;C07C211/65;C23C16/34 主分类号 C07F7/28
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