METHODS OF MAKING MOLYBDENUM TITANIUM SPUTTERING PLATES AND TARGETS

摘要

Molybdenum titanium sputter targets are provided. In one aspect, the targets are substantially free of the ß(Ti, Mo) alloy phase. In another aspect, the targets are substantially comprised of single phase ß(Ti, Mo) alloy. In both aspects, particulate emission during sputtering is reduced. Methods of preparing the targets, methods of bonding targets together to produce large area sputter targets, and films produced by the targets, are also provided.