METHOD OF MONITORING OPTICAL INTEGRATOR OF PHOTO-LITHOGRAPHY SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a method of monitoring an optical integrator of a photo-lithography system equipped with a light source for irradiating fields of distinct photosensitive layers and the optical integrator for measuring an actual exposure amount of the irradiated fields.

SOLUTION: This method comprises a step of continuously irradiating the fields of distinct photosensitive layers 12. In each irradiating step, the actual exposure amount is measured by an optical integrator 18. An actual exposure time is controlled so that the actual exposure amount by which the fields of the photosensitive layers 12 are exposed may correspond to a desired exposure amount. The actual exposure time is supplied to a monitoring system 24 which carries out an in-line monitoring of the optical integrator 18 during an irradiation of the fields.

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