| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive type resist composition exhibiting sufficient transmittance at the time of using a light source of 157 nm and having satisfied coating property and development defect. SOLUTION: The positive resist composition contains (A) a resin, which has at least one repeating unit having a structure of general formula (1) and is decomposable by the action of an acid to increase the solubility to an alkali developer and (B) a compound generating the acid by the irradiation with active ray or radiation. |
