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发明名称
METHOD FOR FORMING DENSE HOLE PHOTORESIST PATTERN AND HOLE PHOTO MASK USED THEREFOR
摘要
申请公布号
KR20070041158(A)
申请公布日期
2007.04.18
申请号
KR20050097015
申请日期
2005.10.14
申请人
DONGBU ELECTRONICS CO., LTD.
发明人
MOON, JU HYOUNG
分类号
H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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