发明名称 |
Gas dispersion plate and manufacturing method therefor |
摘要 |
To provide an inexpensive gas dispersion plate having a high corrosion resistance to halogen-based corrosive gasses and a plasma thereof, and capable of preventing particle generation from the gas hole, thereby contributing to an improvement in the production yield of the semiconductor devices. The gas dispersion plate includes one or plural gas holes in a base material formed by a Y<SUB>2</SUB>O<SUB>3 </SUB>ceramic material having a relative density of 96% or more, in which an edge part of the gas hole is formed by a sand blasting process into a rounded shape with a radius of curvature of 0.2 mm or more.
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申请公布号 |
US2007079934(A1) |
申请公布日期 |
2007.04.12 |
申请号 |
US20060512431 |
申请日期 |
2006.08.30 |
申请人 |
TOSHIBA CERAMICS CO., LTD. |
发明人 |
MURATA YUKITAKA;NAGASAKA SACHIYUKI;MORITA KEIJI;WATANABE KEISUKE;WAKABAYASHI SHIGENORI |
分类号 |
H01L21/306;C23C16/00;C23F1/00 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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