| 摘要 |
<p>The invention relates to a Illumination system for a microlithography exposure apparatus comprising an optical element, especially filter, wherein said optical element comprises: an at least partially hollow body onto which a radiation within an optical system impinges; wherein inside said hollow body a fluid medium is provided, wherein the fluid medium influences at least partially the optical properties of the radiation impinging on said optical element and a device for locally adjusting the optical properties by said fluid medium.</p> |
