| 摘要 |
A hard film formed by an arc-discharge ion-plating method, having a composition comprising metal components represented by AlxCr1-x-ySiy, wherein x and y are respectively atomic ratios meeting 0.45≤x≤0.75, 0≤y≤0.35, and 0.5≤x +y < 1, and non-metal components represented by N1- alpha - beta - gamma B alpha C beta O gamma , wherein alpha , beta and gamma are respectively atomic ratios meeting 0≤alpha≤0.15, 0≤beta≤0.35, and 0.003≤gamma≤0.25, the hard film having an NaCl-type crystal structure, with a half width of 2θat an X-ray diffraction peak corresponding to a (111) face or a (200) face being 0.5-2.0 DEG , and the hard film containing oxygen more in grain boundaries than in crystal grains. |
