发明名称 HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL AND METHOD FOR PRODUCING SAME
摘要 PROBLEM TO BE SOLVED: To provide a high quality heat developable photosensitive material having improved coated surface condition and a method for producing the same. SOLUTION: The heat developable photosensitive material has on a support an image forming layer containing a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent for silver ions and a binder and at least one non-photosensitive layer, wherein the heat developable photosensitive material contains at least one surfactant selected from a substituted phenoxypolyethyleneoxyalkyl(or aryl)sulfonate, a compound of formula II and a sulfosuccinic ester, wherein L represents a bond or -O(CH<SB>2</SB>CH<SB>2</SB>O)<SB>m3</SB>-; and Y<SB>1</SB>represents H, methyl or -COOM. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007078869(A) 申请公布日期 2007.03.29
申请号 JP20050264373 申请日期 2005.09.12
申请人 FUJIFILM CORP 发明人 FUSHIMI HIDEO
分类号 G03C1/498;G03C1/74;G03C1/76 主分类号 G03C1/498
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