发明名称 |
Verfahren zur Herstellung einer transparenten leitfähigen Schicht, eine durch dieses Verfahren hergestellte transparente und leitfähige Schicht und Material, das diese Schicht enthält |
摘要 |
A transparent conductive layer forming method is disclosed which comprises the steps of introducing a reactive gas to a discharge space, exciting the reactive gas in a plasma state by discharge at atmospheric pressure or at approximately atmospheric pressure, and exposing a substrate to the reactive gas in a plasma state to form a transparent conductive layer on the substrate, wherein the reactive gas comprises a reducing gas. |
申请公布号 |
DE60218109(D1) |
申请公布日期 |
2007.03.29 |
申请号 |
DE2002618109 |
申请日期 |
2002.11.28 |
申请人 |
KONICA CORP. |
发明人 |
TSUJI, TOSHIO;ITOH, HIROTO;KIYOMURA, TAKAKAZU |
分类号 |
C23C16/40;H01L21/205;C23C16/44;C23C16/455;C23C16/50 |
主分类号 |
C23C16/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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