发明名称 SPUTTERING DEPOSITION APPARATUS WITH BARRIER FILM FORMED ON UPPER PORTION OF OPENING OF TARGET MOUNTING MEMBER
摘要 Disclosed is a sputtering deposition device for depositing a thin film on a substrate. The sputtering deposition device comprises a substrate fixing part configured to fix a substrate; a target mounting member configured to mount a target and form an opening part on a front surface or a part of the top thereof; and a blocking shield provided on the top of the target mounting member. The present invention can minimize ion damage and heat damage of an organic thin film by blocking particles having strong energy and scanning the substrate in a horizontal direction.
申请公布号 KR20070034159(A) 申请公布日期 2007.03.28
申请号 KR20050088494 申请日期 2005.09.23
申请人 发明人
分类号 H01L21/203 主分类号 H01L21/203
代理机构 代理人
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