发明名称 Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surface
摘要 An overhead gas distribution electrode forming at least a portion of the ceiling of a plasma reactor has a bottom surface facing a processing zone of the reactor. The electrode includes a gas supply manifold for receiving process gas at a supply pressure at a top portion of the electrode and plural pressure-dropping cylindrical orifices extending axially relative to the electrode from the gas supply manifold at one end of each the orifice. A radial gas distribution manifold within the electrode extends radially across the electrode. Plural axially extending high conductance gas flow passages couple the opposite ends of respective ones of the plural pressure-dropping orifices to the radial gas distribution manifold. Plural high conductance cylindrical gas outlet holes are formed in the plasma-facing bottom surface of the electrode and extend axially to the radial gas distribution manifold.
申请公布号 US7196283(B2) 申请公布日期 2007.03.27
申请号 US20050046538 申请日期 2005.01.28
申请人 APPLIED MATERIALS, INC. 发明人 BUCHBERGER, JR. DOUGLAS A.;HOFFMAN DANIEL J.;REGELMAN OLGA;CARDUCCI JAMES;HORIOKA KEIJI;YANG JANG GYOO
分类号 B23K9/00;H01J37/32 主分类号 B23K9/00
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