发明名称 SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To achieve IGBT having a high withstand voltage, a low on-voltage, and a wide area of safe operation. <P>SOLUTION: In IGBT having at least a p+n-pn+ structure from a collector side to an emitter side, and an n layer having high concentration compared with an n- layer between the n- layer and a p layer, an n layer having the further high concentration compared with the n layer is formed between the n- layer and the p layer. Since an avalanche is induced in the n layer having the high concentration, an area of safe operation is expanded. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007074002(A) 申请公布日期 2007.03.22
申请号 JP20060340395 申请日期 2006.12.18
申请人 HITACHI LTD 发明人 KOYAMA KAZUHIRO;MORI MUTSUHIRO;KOBAYASHI HIDEO;SAITO KATSUAKI;NISHIMURA YOSHITAKA
分类号 H01L29/739;H01L29/78 主分类号 H01L29/739
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